proximityexposure

由 GE Khalil 著作 · 2021 · 被引用 8 次 — Proximity exposure was calculated as the proportion of an individual's network peers who smoked, considering their distance from the individual.

由 SNS Nonogaki 著作 · 1993 · 被引用 4 次 — The method utilizes a mask containing an equal-width line-and-space pattern of the half-wavelength phase shifter. A film of photoresist formed on a substrate is ...

2020年5月4日 — Exposure Mode: Proximity The alternate to contact exposure is to use proximity exposure. Here the mask and wafer never touch and are held ...

In proximity exposure there is no direct contact of the photomask and the resist. Thus only a shadow image is projected onto the wafer which results in a much ...

Proximity exposure is similar to contact exposure, but the mask is here positioned above the photo resist in a distance of approximately 10 – 50 m m. Damages of ...

由 TY Chang 著作 · 2013 · 被引用 1 次 — This study aims to produce a high fill factor microlens with a specific tilt angle and uses it to enhancing the brightness of film with a light-emitting ...

- Post Exposure Bake (PEB). 3. Developing. - develop. - After Developing Inspection ... Method : Oven, Contact Hot-plate, Proximity Hot-plate. Contact Hot-plate.